Export citation

Export citation

Choose format for download:

Download Citation
  • Access by Xinjiang University

Role of the thermophoretic force on the transport of nanoparticles in dusty silane plasmas

Kathleen De Bleecker* and Annemie Bogaerts

Wim Goedheer

  • PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Belgium

  • FOM Institute for Plasma Physics ‘‘Rijnhuizen,’’ Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

  • *Electronic address: kathleen.debleecker@ua.ac.be

Phys. Rev. E 71, 066405 – Published 21 June, 2005

DOI: https://doi.org/10.1103/PhysRevE.71.066405

Abstract

A comparison, based on numerical modeling, is made between the different forces experienced by nanoparticles present in a low pressure capacitively coupled parallel-plate silane (SiH4) discharge. We investigate in particular the influence of the thermophoretic force on the spatial distribution of the nanoparticle density profiles, due to a thermal gradient in gas temperature induced by heating or cooling of the electrodes. A series of simulations with a one-dimensional fluid model are performed with asymmetrical variation of the electrode temperatures. It appears that the resulting density profile of the nanoparticles experiences a significant shift towards the cooler electrode as soon as a temperature difference is applied. Thus thermophoresis is capable of influencing the force balance of suspended nanoparticles in the plasma, even at relatively small electrode temperature differences.

Article Text

References (25)

  1. A. Bouchoule, in Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by A. Bouchoule (Wiley, Chichester, UK, 1999).
  2. S. V. Vladimirov and K. Ostrikov, Phys. Rep. 393, 175 (2004).
  3. Y. Poissant, P. Chatterjee, and P. Roca i Cabarrocas, J. Appl. Phys. 94, 7305 (2003).
  4. K. De Bleecker, A. Bogaerts, R. Gijbels, and W. Goedheer, Phys. Rev. E 69, 056409 (2004).
  5. K. De Bleecker, A. Bogaerts, W. Goedheer, and R. Gijbels, IEEE Trans. Plasma Sci. 32, 691 (2004).
  6. M. S. Barnes, J. H. Keller, J. C. Forster, J. A. O’Neill, and D. K. Coultas, Phys. Rev. Lett. 68, 313 (1992).
  7. D. B. Graves, J. E. Daugherty, M. D. Kilgore, and R. K. Porteous, Plasma Sources Sci. Technol. 3, 433 (1994).
  8. G. M. Jellum, J. E. Daugherty, and D. B. Graves, J. Appl. Phys. 69, 6923 (1991).
  9. J. E. Daugherty, R. K. Porteous, and D. B. Graves, J. Appl. Phys. 73, 1617 (1993).
  10. K. De Bleecker, A. Bogaerts, and W. Goedheer, Phys. Rev. E 70, 056407 (2004).
  11. P. P. Rutkevych, K. Ostrikov, S. Xu, and S. V. Vladimirov, J. Appl. Phys. 96, 4421 (2004).
  12. T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991).
  13. M. R. Akdim and W. J. Goedheer, J. Appl. Phys. 94, 104 (2003).
  14. J. Perrin, P. Molinàs-Mata, and Ph. Belenguer, J. Phys. D 27, 2499 (1994).
  15. H. Hahn and R. S. Averback, J. Appl. Phys. 67, 113 (1990).
  16. G. J. Nienhuis, W. J. Goedheer, E. A. G. Hamers, W. G. J. H. M. van Sark, and J. Bezemer, J. Appl. Phys. 82, 2060 (1997).
  17. J. D. P. Passchier and W. J. Goedheer, J. Appl. Phys. 73, 1073 (1993).
  18. L. Boufendi and A. Bouchoule, Plasma Sources Sci. Technol. 3, 262 (1994).
  19. J. Perrin, C. Böhm, R. Etemadi, and A. Lloret, Plasma Sources Sci. Technol. 3, 252 (1994).
  20. S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
  21. Ch. Hollenstein, Plasma Phys. Controlled Fusion 42, R93 (2000).
  22. J. Perrin, O. Leroy, and M. C. Bordage, Contrib. Plasma Phys. 36, 3 (1996).
  23. L. Talbot, R. K. Cheng, R. W. Schefer, and D. R. Willis, J. Fluid Mech. 101, 737 (1980).
  24. A. Bouchoule and L. Boufendi, Plasma Sources Sci. Technol. 2, 204 (1993).
  25. J.-L. Dorier, Ch. Hollenstein, A. A. Howling, and U. Kroll, J. Vac. Sci. Technol. A 10, 1048 (1992).

Outline

Information

Sign In to Your Journals Account

Filter

Filter

Article Lookup

Enter a citation