- Physical Review Journals
All JournalsPhysics Magazine
Access Provided by Xinjiang University

Physical Review E

Export citation

Export citation

Choose format for download:

Download Citation
  • Access by Xinjiang University

Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges

E. R. Kieft*, K. Garloff, and J. J. A. M. van der Mullen†

V. Banine

  • Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

  • ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands

  • *Electronic address: e.r.kieft@tue.nl
  • †Corresponding author. Electronic address:j.j.a.m.v.d.mullen@tue.nl
PDF

Phys. Rev. E 71, 036402 – Published 11 March, 2005

DOI: https://doi.org/10.1103/PhysRevE.71.036402

Abstract

Xenon and tin both are working elements applied in discharge plasmas that are being developed for application in extreme ultraviolet (EUV) lithography. Their spectra in the 10–21-nm-wavelength range have been analyzed. A fully analytical collisional-radiative model, including departure from equilibrium due to a net ionization rate, was used to simulate the EUV spectra. Detailed Hartree-Fock calculations, using the COWAN package, were applied for determination of the energy levels and optical transition probabilities of the 8+ to 12+ ions of both elements. For the calculation of the radiation, the opacity of the plasma was taken into account. Time-resolved measurements of the spectra from ionizing phases of two different discharge plasmas were corrected for the wavelength-dependent sensitivity of the spectrometer, and compared to the results of the simulations. Fairly good agreement between the experiments and the model calculations has been found.

View figure in article

Article Text

References (38)

  1. M. A. Klosner and W. T. Silfvast, Opt. Lett. 23, 1609 (1998).
  2. S. R. Mohanty, C. Cachoncinlle, C. Fleurier, E. Robert, J.-M. Pouvesle, R. Viladrosa, and R. Dussart, Microelectron. Eng. 61-62, 179 (2002).
  3. M. McGeoch, Appl. Opt. 37, 1651 (1998).
  4. V. M. Borisov, I. Ahmad, S. Goetze, A. S. Ivanov, O. B. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, U. Stamm, and A. Y. Vinokhodov, Proc. SPIE 4688, 626 (2002).
  5. W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T. Melnychuk, and J. E. Rauch, Proc. SPIE 4343, 232 (2001).
  6. M. W. McGeoch and C. T. Pike, Proc. SPIE 5037, 141 (2003).
  7. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, Appl. Opt. 38, 5413 (1999).
  8. Proceedings of the EUV Source Workshop, International SEMATECH, Antwerp, Belgium, edited by V. Bakshi, 2003.
  9. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, and V. Banine, Phys. Rev. E 68, 056403 (2003).
  10. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, V. Banine, and K. N. Koshelev, Phys. Rev. E 71, 026409 (2005).
  11. R. Radtke, C. Biedermann, J. L. Schwob, P. Mandelbaum, and R. Doron, Phys. Rev. A 64, 012720 (2001).
  12. K. Asmussen, K. B. Fournier, J. M. Laming, R. Neu, J. F. Seely, R. Dux, W. Engelhardt, J. C. Fuchs, and ASDEX Upgrade Team, Nucl. Fusion 38, 967 (1998).
  13. M. J. May, K. B. Fournier, D. Pacella, H. Kroegler, J. E. Rice, B. Gregory, M. Finkenthal, H. W. Moos, G. Mazzitelli, and W. H. Goldstein, Phys. Rev. E 61, 3042 (2000).
  14. V. A. Soukhanovskii, S. Lippmann, M. J. May, M. Finkenthal, H. W. Moos, K. B. Fournier, W. Goldstein, D. Pacella, and G. Mazzitelli, Astron. Astrophys., Suppl. Ser. 142, 95 (2000).
  15. F. Gilleron, M. Poirier, T. Blenski, M. Schmidt, and T. Ceccotti, J. Appl. Phys. 94, 2086 (2003).
  16. N. Böwering, M. Martins, W. N. Partlo, and I. V. Fomenkov, J. Appl. Phys. 95, 16 (2004).
  17. M. C. Richardson, C.-S. Koay, K. Takenoshita, C. Keyser, S. George, S. Teerawattanasook, M. Al-Rabban, and H. Scott, Proc. SPIE 5374, 447 (2004).
  18. K. Garloff, M. van den Donker, J. J. A. M. van der Mullen, F. van Goor, R. Brummans, and J. Jonkers, Phys. Rev. E 66, 036403 (2002).
  19. J. J. A. M. van der Mullen, Ph.D. thesis, Eindhoven University of Technology, Eindhoven, 1986, http://alexandria.tue.nl/extra3/proefschrift/PRF5A/8601253.pdf
  20. J. A. M. van der Mullen, Phys. Rep. 191, 109 (1990).
  21. Y.-K. Kim, MCDF on-line execution, http://amods.kaeri.re.kr/mcdf/MCDF.html
  22. L. Vriens and A. H. M. Smeets, Phys. Rev. A 22, 940 (1980).
  23. H. van Regemorter, Astrophys. J. 136, 906 (1962).
  24. M. J. Seaton, Mon. Not. R. Astron. Soc. 119, 81 (1959).
  25. A. C. Kolb and R. W. P. McWhirter, Phys. Fluids 7, 519 (1964).
  26. M. Masnavi, M. Nakajima, and K. Horioka, J. Plasma Fusion Res. 79, 1188 (2003).
  27. T. Fujimoto, J. Phys. Soc. Jpn. 47, 273 (1979).
  28. H. R. Griem, Phys. Rev. 165, 258 (1968).
  29. R. D. Cowan, The Theory of Atomic Structure and Spectra (University of California Press, Berkeley, 1981) (code in a version for personal computers, edited by A. Kramida, at http://das101.isan.troitsk.ru/cowan.htm).
  30. H. Henneken, F. Scholze, M. Krumrey, and G. Ulm, Metrologia 37, 485 (2000).
  31. R. H. Day, P. Lee, E. B. Saloman, and D. J. Nagel, J. Appl. Phys. 52, 6965 (1981).
  32. http://www-cxro.lbl.gov/optical_constants/
  33. R. Stuik, H. Fledderus, P. Hegeman, J. Jonkers, M. Visser, V. Banine, and F. Bijkerk, in Proceedings of the Second SEMATECH Workshop on Extreme UV Lithography, San Francisco, 2002 (unpublished).
  34. E. R. Kieft, J. J. A. M. van der Mullen, G. M. W. Kroesen, V. Banine, and K. N. Koshelev, Phys. Rev. E 70, 056413 (2004).
  35. S. S. Churilov and Y. N. Joshi, Phys. Scr. 65, 40 (2002).
  36. J. Blackburn, P. Carroll, J. Costello, and G. O’Sullivan, J. Opt. Soc. Am. 73, 1325 (1983).
  37. G. O’Sullivan, J. Phys. B 15, L765 (1982).
  38. B. A. Trubnikov, Rev. Plasma Phys. 1, 105 (1965).

Outline

Information

Phys. Rev. E 71, 036402– Published 11 March, 2005
  • Received 12 October 2004

© 2005 American Physical Society

Sign In to Your Journals Account

Filter

Filter

Article Lookup

Enter a citation