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Width distribution of contact lines on a disordered substrate

Sébastien Moulinet1,*, Alberto Rosso2, Werner Krauth1, and Etienne Rolley1

  • 1CNRS-Laboratoire de Physique Statistique de l’Ecole Normale Supérieure, 24 rue Lhomond, 75231 Paris, France
  • 2Université de Genève, DPMC, 24 Quai Ernest Ansermet, CH-1211 Genève 4, Switzerland

  • *Now at LPMCN, Université Claude Bernard, 43 Boulevard du 11 novembre 1918, 69622 Villeurbanne Cedex, France

Phys. Rev. E 69, 035103(R) – Published 31 March, 2004

DOI: https://doi.org/10.1103/PhysRevE.69.035103

Abstract

We have studied the roughness of a contact line on a disordered substrate by measuring its width distribution, which characterizes the roughness completely. The measured distribution is in excellent agreement with the distribution calculated in previous works, extended here to the case of open boundary conditions. This type of analysis, which is performed here on experimental data, provides a strong confirmation that the Joanny–de Gennes model is not sufficient to describe the dynamics of the contact line at the depinning threshold.

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