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Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors

V. Georgieva*, A. Bogaerts, and R. Gijbels

  • Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium

  • *Electronic address: Violeta.Georgieva@ua.ac.be

Phys. Rev. E 69, 026406 – Published 23 February, 2004

DOI: https://doi.org/10.1103/PhysRevE.69.026406

Abstract

Ion-energy-distribution functions (IEDFs) are numerically investigated in capacitively coupled (cc) radio frequency (rf) Ar/CF4/N2 discharges by a one-dimensional particle-in-cell/Monte Carlo model. The simulation considers electron-neutral collisions, various kinds of collisions of ions (Ar+, CF3+, N2+, F, and CF3) with neutral, positive-negative ion, and electron-ion recombination. The influence of pressure, applied voltage amplitude, and applied frequency on the Ar+, CF3+, and N2+ IEDFs is presented. The dependence on the frequency regime is investigated by simulations of the Ar/CF4/N2 mixture in single (13.56 MHz) and dual frequency (2+27MHz or 1+27MHz) cc reactors. A comparison of the simulation results with analytical calculations in a collisionless rf sheath is discussed. The results show that the IEDFs shift toward the low energies with increasing pressure or decreasing applied voltage amplitude. The Ar+ and N2+ IEDFs exhibit secondary maxima due to the charge transfer collisions. The CF3+ IEDF has a peak at high energies in consistency with the average sheath potential drop. The IEDFs in the dual frequency regime are broad and bimodal.

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