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Order and disorder at the atomic scale: Microscopy applied to semiconductors

Enrico Di Russo, Tom Verstijnen, Paul Koenraad, Konstantinos Pantzas, Gilles Patriarche, and Lorenzo Rigutti*

Enrico Di Russo

Tom Verstijnen and Paul Koenraad

Konstantinos Pantzas and Gilles Patriarche

Lorenzo Rigutti*

  • *Contact author: lorenzo.rigutti@univ-rouen.fr

Rev. Mod. Phys. 97, 025006 – Published 26 June, 2025

DOI: https://doi.org/10.1103/RevModPhys.97.025006

Abstract

Over the past three decades, atomic-scale microscopy techniques (atom-probe tomography, scanning tunneling microscopy, and transmission electron microscopy) have played a significant role in the understanding of order- and disorder-related phenomena in compound semiconductors. The possibility of imaging and quantifying disorder in the direct space within a small and selected field of view, with atomic-scale spatial resolution, and the possibility of retrieving information on composition opened new perspectives and led to a new level of understanding in semiconductor physics. On the basis of results from the domain of III-V semiconductors, this review sketches a synoptic picture of the application of microscopy to the study of order and disorder and aims to establish a clear reference of methods for research facing order- and disorder-related issues in new semiconductor materials.

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