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Colloquium: Reactive plasmas as a versatile nanofabrication tool

K. Ostrikov*

K. Ostrikov*

  • School of Physics, The University of Sydney, Sydney NSW 2006, Australia

  • *Also at: Plasma Sources and Applications Center, NIE, Nanyang Technological University, 637616 Singapore. Electronic address: K.Ostrikov@physics.usyd.edu.au
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Rev. Mod. Phys. 77, 489 – Published 22 June, 2005

DOI: https://doi.org/10.1103/RevModPhys.77.489

Abstract

The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the “cause and effect” approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed.

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Rev. Mod. Phys. 77, 489– Published 22 June, 2005

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