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Coulomb repulsion and Wigner glass of localized electrons and holes in hafnia at room temperature

Vladimir A. Gritsenko

Damir R. Islamov*, Mahmood M. Mahmoodian, Andrei A. Gismatulin, Timur M. Zalyalov, and Matvey V. Entin

Mehrdad M. Mahmoodian

Mikhail S. Lebedev

  • *Contact author: damir@isp.nsc.ru

Phys. Rev. Materials 10, 115001 – Published 9 November, 2026

DOI: https://doi.org/10.1103/v31x-71nc

Abstract

Hafnium oxide HfO2, a high-κ dielectric, replaced SiO2 and now is a key dielectric in modern silicon devices. HfO2 contains deep traps. The effect of electron and hole localization on traps in HfO2 is studied for the use as a storage medium in modern charge trap flash memory devices (CTFM). In this study, we demonstrate that electrons and holes localized on traps in HfO2 exhibit Coulomb repulsion. Due to Coulomb repulsion, the surface concentration of traps filled with electrons and holes is an order of magnitude lower than the total trap concentration. This effect significantly changes our understanding of the physics of CTFM programming processes. Analysis of the correlation distribution function of localized electrons indicates Wigner crystallization of electrons and holes localized in HfO2. Due to the disordered arrangement of traps, electrons and holes localized on traps in HfO2 form a Wigner glass. In contrast to the Wigner crystal of free electrons, which is formed at helium temperatures, the Wigner glass of electrons and holes localized in HfO2, due to deep traps Wt=1.25eV, is observed at room temperature.

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References (45)

  1. Y.-S. Lin, R. Puthenkovilakam, and J. P. Chang, Dielectric property and thermal stability of HfO2 on silicon, Appl. Phys. Lett. 81, 2041 (2002).
  2. H.-C. You, T.-H. Hsu, F.-H. Ko, J.-W. Huang, W.-L. Yang, and T.-F. Lei, SONOS-type flash memory using an HfO2 as a charge trapping layer deposited by the sol-gel spin-coating method, IEEE Electron Device Lett. 27, 653 (2006).
  3. Z.-H. Ye, K.-S. Chang-Liao, T.-C. Liu, T.-K. Wang, P.-J. Tzeng, C.-H. Lin, and M.-J. Tsai, A novel SONOS-type flash device with stacked charge trapping layer, Microelectron. Eng. 86, 1863 (2009).
  4. G. Congedo, C. Wiemer, A. Lamperti, E. Cianci, A. Molle, F. G. Volpe, and S. Spiga, Atomic layer-deposited Al–HfO2/SiO2 bi-layers towards 3D charge trapping non-volatile memory, Thin Solid Films 533, 9 (2013).
  5. L.-J. Chen, Y.-C. Wu, J.-H. Chiang, M.-F. Hung, C.-W. Chang, and P.-W. Su, Comprehensive study of Pi-gate nanowires poly-Si TFT nonvolatile memory with an HfO2 charge trapping layer, IEEE Trans. Nanotechnol. 10, 260 (2011).
  6. P.-H. Tsai, K.-S. Chang-Liao, T.-C. Liu, T.-K. Wang, P.-J. Tzeng, C.-H. Lin, L. S. Lee, and M.-J. Tsai, Charge-trapping-type flash memory device with stacked high-k charge-trapping layer, IEEE Electron Device Lett. 30, 775 (2009).
  7. Y. Zhang, Y. Y. Shao, X. B. Lu, M. Zeng, Z. Zhang, X. S. Gao, X. J. Zhang, J.-M. Liu, and J. Y. Dai, Defect states and charge trapping characteristics of HfO2 films for high performance nonvolatile memory applications, Appl. Phys. Lett. 105, 172902 (2014).
  8. T. Noh, J. Han, B. Jeong, J.-G. Park, K. Kim, M. Lee, B. Kim, H. Choi, and T.-S. Yoon, Electron and hole trapping characteristics of a low-temperature atomic layer-deposited HfO2 charge-trap layer for charge-trap flash memory, ACS Appl. Electron. Mater. 7, 1632 (2025).
  9. V. A. Gritsenko, T. V. Perevalov, and D. R. Islamov, Electronic properties of hafnium oxide: A contribution from defects and traps, Phys. Rep. 613, 1 (2016).
  10. E. Wigner, On the interaction of electrons in metals, Phys. Rev. 46, 1002 (1934).
  11. E. Wigner, Effects of the electron interaction on the energy levels of electrons in metals, Trans. Faraday Soc. 34, 678 (1938).
  12. H. M. Van Horn, Instability and melting of the electron solid, Phys. Rev. 157, 342 (1967).
  13. R. S. Crandall and R. Williams, Crystallization of electrons on the surface of liquid helium, Phys. Lett. A 34, 404 (1971).
  14. C. C. Grimes and G. Adams, Evidence for a liquid-to-crystal phase transition in a classical, two-dimensional sheet of electrons, Phys. Rev. Lett. 42, 795 (1979).
  15. Y. Zhou, D. Sheng, and E.-A. Kim, Quantum melting of generalized Wigner crystals in transition metal dichalcogenide moiré systems, Phys. Rev. Lett. 133, 156501 (2024).
  16. E. C. Regan, D. Wang, C. Jin, M. I. B. Utama, B. Gao, X. Wei, S. Zhao, W. Zhao, Z. Zhang, K. Yumigeta, M. Blei, J. D. Carlström, K. Watanabe, T. Taniguchi, S. Tongay, M. Crommie, A. Zettl, and F. Wang, Mott and generalized Wigner crystal states in WSe2/WS2 moiré superlattices, Nature (London) 579, 359 (2020).
  17. Y. Xu, S. Liu, D. A. Rhodes, K. Watanabe, T. Taniguchi, J. Hone, V. Elser, K. F. Mak, and J. Shan, Correlated insulating states at fractional fillings of moiré superlattices, Nature (London) 587, 214 (2020).
  18. H. Li, S. Li, E. C. Regan, D. Wang, W. Zhao, S. Kahn, K. Yumigeta, M. Blei, T. Taniguchi, K. Watanabe, S. Tongay, A. Zettl, M. F. Crommie, and F. Wang, Imaging two-dimensional generalized Wigner crystals, Nature (London) 597, 650 (2021).
  19. X. Huang, T. Wang, S. Miao, C. Wang, Z. Li, Z. Lian, T. Taniguchi, K. Watanabe, S. Okamoto, D. Xiao, S.-F. Shi, and Y.-T. Cui, Correlated insulating states at fractional fillings of the WS2/WSe2 moiré lattice, Nat. Phys. 17, 715 (2021).
  20. H. Li, Z. Xiang, A. P. Reddy, T. Devakul, R. Sailus, R. Banerjee, T. Taniguchi, K. Watanabe, S. Tongay, A. Zettl, L. Fu, M. F. Crommie, and F. Wang, Wigner molecular crystals from multielectron moiré artificial atoms, Science 385, 86 (2024).
  21. A. Valenti, V. Calvera, Y. Yang, M. A. Morales, S. A. Kivelson, I. Esterlis, and S. Zhang, Critical gate distance for Wigner crystallization in the two-dimensional electron gas, Phys. Rev. Lett. 135, 166501 (2025).
  22. A. V. Filinov, M. Bonitz, and Y. E. Lozovik, Wigner crystallization in mesoscopic 2D electron systems, Phys. Rev. Lett. 86, 3851 (2001).
  23. S.-C. Ho, H.-J. Chang, C.-H. Chang, S.-T. Lo, G. Creeth, S. Kumar, I. Farrer, D. Ritchie, J. Griffiths, G. Jones, M. Pepper, and T.-M. Chen, Imaging the zigzag Wigner crystal in confinement-tunable quantum wires, Phys. Rev. Lett. 121, 106801 (2018).
  24. M. Ostilli and C. Presilla, Wigner crystallization of electrons in a one-dimensional lattice: A condensation in the space of states, Phys. Rev. Lett. 127, 040601 (2021).
  25. V. V. Deshpande and M. Bockrath, The one-dimensional Wigner crystal in carbon nanotubes, Nat. Phys. 4, 314 (2008).
  26. V. A. Gritsenko, Wigner crystallization and a resonance exchange mechanism for electrons localized in an amorphous insulator with a high trap density, JETP Lett. 64, 525 (1996).
  27. V. A. Gritsenko and A. D. Milov, Wigner crystallization of electrons and holes in amorphous silicon nitride. Antiferromagnetic ordering of localized electrons and holes as a result of a resonance exchange interaction, J. Exp. Theor. Phys. Lett. 64, 531 (1996).
  28. A. I. Shames, V. A. Gritsenko, R. I. Samoilova, Y. D. Tzvetkov, L. S. Braginsky, and M. Roger, EPR-study of nitrogen implanted silicon nitride, Solid State Commun. 118, 129 (2001).
  29. S. S. Shaimeev, V. A. Gritsenko, and H. Wong, Wigner crystallization due to electrons localized at deep traps in two-dimensional amorphous dielectric, Appl. Phys. Lett. 96, 263510 (2010).
  30. M. M. Mahmoodian, M. M. Mahmoodian, and M. V. Entin, Theory of flash memory based on a two-dimensional Wigner cluster, Phys. Solid State 67, 1730 (2025).
  31. K. A. Nasyrov and V. A. Gritsenko, Charge transport in dielectrics via tunneling between traps, J. Appl. Phys. 109, 093705 (2011).
  32. A. A. Pil'nik, A. A. Chernov, and D. R. Islamov, Charge transport mechanism in dielectrics: Drift and diffusion of trapped charge carriers, Sci. Rep. 10, 15759 (2020).
  33. J. Frenkel, On pre-breakdown phenomena in insulators and electronic semi-conductors, Phys. Rev. 54, 647 (1938).
  34. J. Frenkel, On the theory of electric breakdown of dielectrics and electronic semiconductors, Technical Physics of the USSR 5, 685 (1938).
  35. D. S. Jeong, H. B. Park, and C. S. Hwang, Reasons for obtaining an optical dielectric constant from the Poole-Frenkel conduction behavior of atomic-layer-deposited HfO2 films, Appl. Phys. Lett. 86, 072903 (2005).
  36. S. Pan, S.-J. Ding, Y. Huang, Y.-J. Huang, D. W. Zhang, L.-K. Wang, and R. Liu, High-temperature conduction behaviors of HfO2/TaN-based metal-insulator-metal capacitors, J. Appl. Phys. 102, 073706 (2007).
  37. R. G. Southwick, J. Reed, C. Buu, R. Butler, G. Bersuker, and W. B. Knowlton, Limitations of Poole–Frenkel conduction in bilayer HfO2/SiO2 MOS devices, IEEE Trans. Device Mater. Reliab. 10, 201 (2010).
  38. C. Walczyk, D. Walczyk, T. Schroeder, T. Bertaud, M. Sowińska, M. Lukosius, M. Fraschke, D. Wolansky, B. Tillack, E. Miranda, and C. Wenger, Impact of temperature on the resistive switching behavior of embedded HfO2-based RRAM devices, IEEE Trans. Electron Devices 58, 3124 (2011).
  39. D. R. Islamov, V. A. Gritsenko, C. H. Cheng, and A. Chin, Origin of traps and charge transport mechanism in hafnia, Appl. Phys. Lett. 105, 222901 (2014).
  40. D. R. Islamov and A. A. Chernov, Advanced approximation for the probability of phonon-assisted tunneling between traps, Appl. Phys. Lett. 128, 052901 (2026).
  41. D. R. Islamov, V. A. Gritsenko, C. H. Cheng, and A. Chin, Bipolar conductivity in amorphous HfO2, Appl. Phys. Lett. 99, 072109 (2011).
  42. D. R. Islamov, T. M. Zalyalov, V. A. Voronkovskii, A. K. Markelova, A. A. Pil'nik, T. V. Perevalov, M. N. Davydov, and A. A. Chernov, Mathematical modeling of charge transport in the dielectric layer of HfOx memristor taking into account single charged traps, Russ. Microelectron. 54, 922 (2025).
  43. F. L. Martínez, M. Toledano-Luque, J. J. Gandía, J. Cárabe, W. Bohne, J. Röhrich, E. Strub, and I. Mártil, Optical properties and structure of HfO2 thin films grown by high pressure reactive sputtering, J. Phys. D: Appl. Phys. 40, 5256 (2007).
  44. V. A. Shvets, V. N. Kruchinin, and V. A. Gritsenko, Dispersion of the refractive index in high-k dielectrics, Opt. Spectrosc. 123, 728 (2017).
  45. V. A. Gritsenko, M. M. Mahmoodian, M. M. Mahmoodian, A. A. Gismatulin, and M. V. Entin, Wigner crystallization of localized electrons in a flash memory, Appl. Phys. Lett. 127, 222901 (2025).

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