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Hierarchical micro- and nanofabrication by pattern-directed contact instabilities of thin viscoelastic films

Abir Ghosh1, Dipankar Bandyopadhyay2,3,*, Jayati Sarkar4, and Ashutosh Sharma1,†

  • 1Department of Chemical Engineering, Indian Institute of Technology Kanpur, Uttar Pradesh 208016, India
  • 2Department of Chemical Engineering, Indian Institute of Technology Guwahati, Assam 781039, India
  • 3Centre for Nanotechnology, Indian Institute of Technology Guwahati, Assam 781039, India
  • 4Department of Chemical Engineering, Indian Institute of Technology Delhi, New Delhi 110016, India

  • *dipban@iitg.ernet.in
  • †ashutos@iitk.ac.in
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Phys. Rev. Fluids 2, 124004 – Published 20 December, 2017

DOI: https://doi.org/10.1103/PhysRevFluids.2.124004

Abstract

A surface of a thin viscoelastic film forms spinodal patterns when brought in contact proximity of another surface due to the dominance of destabilizing intermolecular interaction over the stabilizing elastic and surface tension forces. In this study, we theoretically explore such contact instabilities of a thin viscoelastic film, wherein the patterns generated on the surface of the film is developed with the help of a contactor decorated with periodic physical, chemical, and physicochemical features on the surface. The nonlinear analysis shown here considers the movement of the patterned contactor during the adhesion and debonding processes, which is unlike most of the previous works where the contactor is considered to be stationary. The simulations reveal that the amplitude and periodicity of the patterns decorated on the contactor together with the contactor speed can be the key parameters to stimulate pattern formation on the film surface alongside causing changeover of the various modes of debonding of the surfaces. In particular, the ratio of the elastic to viscous compliances of the film is found to play a critical role to stimulate the changeover of the modes from catastrophic to peeling or coalescence. The study uncovers that a higher wettability contrast across the patterned contactor leads to the catastrophic collapse of the patterns decorated on the film surface when the contactor debonds at a moderate speed. In comparison, a moderately high wettability contrast alongside a faster withdrawal speed of the contactor results in the gradual peeling of columns during the debonding cycle. Remarkably, a higher withdrawal speed of the contactor from the film-proximity can increase the aspect ratio of the patterns fabricated on the film surface to about fourfold during the peeling mode of debonding. The results show the importance of the usage of patterned contactors, their controlled movement, and extent of elastic to viscous compliance ratio of the film for the improvement of the aspect ratio of the patterns developed using the elastic contact lithography of the thin viscoelastic films. The simulations also reveal the possibilities of the fabrication of biomimetic micro- or nanostructures such as columns, holes, cavities, or a combination of these patterns with large-area ordering employing the patterned contactors. A few example cases are shown to highlight the capacity of the proposed methodology for the fabrication of higher aspect ratio hierarchical micro- or nanostructures.

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Phys. Rev. Fluids 2, 124004– Published 20 December, 2017
  • Received 9 April 2017

©2017 American Physical Society

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