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Theoretical calculations of H interacting with Si(100) 1 × 1
Phys. Rev. B 15, 2006 – Published 15 February, 1977
DOI: https://doi.org/10.1103/PhysRevB.15.2006
Abstract
We have performed fully self-consistent calculations of the electronic properties of a monolayer of H interacting with a Si(100) 1 × 1 surface in order to understand the chemisorptive properties of highly unsaturated Si surface atoms [Si (100) 1 × 1 has two broken bonds per surface atom]. A total of eight separate geometries were studied, corresponding to Si-H separations ranging from 2.8 to 4.4 a.u. It was found that the Si monolayer had an equilibrium separation of 2.86 a.u. and an equilibrium force constant of a.u. The interaction potential between the H monolayer and the Si substrate was well fit by empirical interaction potentials of the Morse and Rydberg form, which implied a dissociation energy for the Si-H bond of 3.4 eV. The surface spectrum was also studied, the most interesting features of which were a Si-H bonding surface-state band similar in position to that found on Si(111), and a lone-orbital surface-state band, half occupied and essentially identical to the bridge bond state on clean Si(100).
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