Export citation

Export citation

Choose format for download:

Download Citation
  • Access by Xinjiang University

Electronic band structure of GaN diluted and overdiluted with group-V elements

Jakub Ziembicki*,¶, Rafał Bartoszewicz, Miłosz Grodzicki, Paweł Scharoch, and Robert Kudrawiec†,‡

Wojciech Olszewski§,¶, Damian Pucicki, and Detlef Hommel

Maciej P. Polak

  • *Contact author: jakub.ziembicki@pwr.edu.pl
  • Contact author: robert.kudrawiec@pwr.edu.pl
  • Also at Łukasiewicz Research Network – PORT Polish Center for Technology Development, Stabłowicka 147, Wrocław 54-066, Poland.
  • §Also at Institute of Experimental Physics, University of Wrocław, pl. Maxa Borna 9, Wrocław 50-204, Poland.
  • Also at Department of Nanometrology, Faculty of Electronics, Photonics and Microsystems, Wrocław University of Science and Technology, 50-372 Wrocław, Poland.
  • These authors contributed equally.

Phys. Rev. Applied 23, 024005 – Published 3 February, 2025

DOI: https://doi.org/10.1103/PhysRevApplied.23.024005

Abstract

The technology for manufacturing GaN-based devices is already very mature, but band engineering in this technology is still limited to mixing group-III elements, while the incorporation of group-V elements into GaN can create possibilities in band-gap engineering. In this work, we report comprehensive experimental studies of the electronic band structure for As-diluted and overdiluted GaNAs supported by computational methods based on the state-of-the-art density-functional-theory (DFT) approach. These studies clearly demonstrated that the incorporation of arsenic into GaN modifies the valence band, while the conduction band remains undisturbed up to 8% arsenic content. For the first time, As-related changes in the valence band are studied with high resolution in electron photoemission spectroscopy. As-related narrowing of the energy gap is also detected in the absorption spectra. These experimental observations are very consistent with the calculations of the electronic band structure for GaNAs, and therefore the same DFT approach was used to calculate the electronic band structure for GaN diluted and overdiluted with the remaining group-V elements, i.e., GaNP, GaNSb, and GaNBi. In this case, it is also clearly visible that adding P, Sb, or Bi to GaN modifies the valence band, while the conduction band remains undisturbed when the V-group concentration does not exceed 5%.

Physics Subject Headings (PhySH)

Article Text

References (57)

  1. I. Akasaki, Nobel lecture: Fascinated journeys into blue light, Rev. Mod. Phys. 87, 1119 (2015).
  2. H. Amano, Nobel lecture: Growth of GaN on sapphire via low-temperature deposited buffer layer and realization of p-type GaN by Mg doping followed by low-energy electron beam irradiation, Rev. Mod. Phys. 87, 1133 (2015).
  3. S. Nakamura, Nobel lecture: Background story of the invention of efficient blue InGaN light emitting diodes, Rev. Mod. Phys. 87, 1139 (2015).
  4. M. H. Wong, S. Keller, S.D. Nidhi, J. Denninghoff, S. Kolluri, D. F. Brown, J. Lu, N. A. Fichtenbaum, E. Ahmadi, E. Singisetti, et al., N-polar GaN epitaxy and high electron mobility transistors, Semicond. Sci. Technol. 28, 074009 (2013).
  5. I. Vurgaftman, J. R. Meyer, and L. R. Ram-Mohan, Band parameters for III–V compound semiconductors and their alloys, J. Appl. Phys. 89, 5815 (2001).
  6. Z. Yin and X. Tang, A review of energy bandgap engineering in III–V semiconductor alloys for mid-infrared laser applications, Solid State Electron. 51, 6 (2007).
  7. A. E. Yachmenev, S. S. Pushkarev, R. R. Reznik, R. A. Khabibullin, and D. S. Ponomarev, Arsenides- and related III-V materials-based multilayered structures for terahertz applications: Various designs and growth technology, Prog. Cryst. Growth Charact. Mater. 66, 100485 (2020).
  8. J. Li, A. Aierken, Y. Liu, Y. Zhuang, X. Yang, J. H. Mo, R. K. Fan, Q. Y. Chen, S. Y. Zhang, Y. M. Huang, et al., A brief review of high efficiency III-V solar cells for space application, Front. Phys. 8, 631925 (2021).
  9. R. Kudrawiec and D. Hommel, Bandgap engineering in III-nitrides with boron and group V elements: Toward applications in ultraviolet emitters, Appl. Phys. Rev. 7, 041314 (2020).
  10. K. M. Yu, S. V. Novikov, R. Broesler, I. N. Demchenko, J. D. Denlinger, Z. Liliental-Weber, F. Luckert, R. W. Martin, W. Walukiewicz, and C. T. Foxon, Highly mismatched crystalline and amorphous GaN1xAsx alloys in the whole composition range, J. Appl. Phys. 106, 103709 (2009).
  11. S. Novikov, C. Staddon, C. Foxon, K. Yu, R. Broesler, M. Hawkridge, Z. Liliental-Weber, J. Denlinger, I. Demchenko, F. Luckert, et al., Growth by molecular beam epitaxy of amorphous and crystalline GaNAs alloys with band gaps from 3.4 to 0.8 eV for solar energy conversion devices, J. Cryst. Growth 323, 60 (2011).
  12. K. M. Yu, S. V. Novikov, M. Ting, W. L. Sarney, S. P. Svensson, M. Shaw, R. W. Martin, W. Walukiewicz, and C. T. Foxon, Growth and characterization of highly mismatched GaN1xSbx alloys, J. Appl. Phys. 116, 123704 (2014).
  13. M. Henini, Dilute Nitride Semiconductors (Elsevier, Amsterdam, Netherlands, 2005).
  14. J. S. Harris, R. Kudrawiec, H. B. Yuen, S. R. Bank, H. P. Bae, M. A. Wistey, D. Jackrel, E. R. Pickett, T. Sarmiento, L. L. Goddard, et al., Development of GaInNAsSb alloys: Growth, band structure, optical properties and applications, Phys. Status Solidi (b) 244, 2707 (2007).
  15. T.-Y. Seong, I.-T. Bae, C.-J. Choi, D. Y. Noh, Y. Zhao, and C. W. Tu, Microstructures of GaN1xPx layers grown on (0001) GaN substrates by gas source molecular beam epitaxy, J. Appl. Phys. 85, 3192 (1999).
  16. C. Foxon, S. Novikov, T. Li, R. Campion, A. Winser, I. Harrison, M. Kappers, and C. Humphreys, Arsenic incorporation in GaN during growth by molecular beam epitaxy, J. Cryst. Growth 251, 510 (2003).
  17. S. V. Novikov, K. M. Yu, A. X. Levander, Z. Liliental-Weber, R. dos Reis, A. J. Kent, A. Tseng, O. D. Dubon, J. Wu, J. Denlinger, et al., Molecular beam epitaxy of GaN1xBix alloys with high bismuth content, Phys. Status Solidi (a) 209, 419 (2012).
  18. K. M. Yu, W. L. Sarney, S. V. Novikov, D. Detert, R. Zhao, J. D. Denlinger, S. P. Svensson, O. D. Dubon, W. Walukiewicz, and C. T. Foxon, Highly mismatched N-rich GaN1xSbx films grown by low temperature molecular beam epitaxy, Appl. Phys. Lett. 102, 102104 (2013).
  19. K. M. Yu, W. L. Sarney, S. V. Novikov, N. Segercrantz, M. Ting, M. Shaw, S. P. Svensson, R. W. Martin, W. Walukiewicz, and C. T. Foxon, Highly mismatched GaN1xSbx alloys: Synthesis, structure and electronic properties, Semicond. Sci. Technol. 31, 083001 (2016).
  20. S. Yoshida, J. Kikawa, and Y. Itoh, Crystal growth of nitride-rich GaNP by laser-assisted metalorganic chemical-vapor deposition, J. Cryst. Growth 237–239, 1037 (2002).
  21. D. Chen, B. Shen, Z. Bi, K. Zhang, S. Gu, R. Zhang, Y. Shi, Y. Zheng, X. Sun, S. Wan, et al., GaN1xPx ternary alloys with high P composition grown by metal-organic chemical vapor deposition, J. Cryst. Growth 255, 52 (2003).
  22. Y. Tsuda, H. Mouri, M. Araki, Y. Ueta, T. Yuasa, and M. Taneya, Characterization of the GaN-rich side of GaNP grown by metal-organic chemical vapor deposition, Phys. Status Solidi (b) 240, 404 (2003).
  23. D. Chen, B. Shen, Z. Bi, K. Zhang, S. Gu, R. Zhang, Y. Shi, and Y. Zheng, Characterization of GaN1xPx alloys grown by metal-organic chemical vapor deposition, Opt. Mater. 23, 127 (2003).
  24. H. J. Kim, T. G. Andersson, J.-M. Chauveau, and A. Trampert, Arsenic incorporation and its influence on microstructure of wurtzite GaN grown by molecular-beam epitaxy, J. Appl. Phys. 94, 7193 (2003).
  25. H. Na, H. J. Kim, E. Yoon, C. Sone, and Y. Park, Arsenic incorporation and growth mode of GaNAs grown by low-pressure metal-organic chemical vapor deposition, J. Cryst. Growth 248, 437 (2003).
  26. H. D. Li, M. Tsukihara, Y. Naoi, Y. B. Lee, and S. Sakai, Investigations of V-shaped defects and photoluminescence of thin GaN-rich GaNP layers grown on a GaN epilayer by metalorganic chemical vapor deposition, Appl. Phys. Lett. 84, 1886 (2004).
  27. A. Kimura, C. A. Paulson, H. F. Tang, and T. F. Kuech, Epitaxial GaN1yAsy layers with high As content grown by metalorganic vapor phase epitaxy and their band gap energy, Appl. Phys. Lett. 84, 1489 (2004).
  28. S.-H. Moon, H.-A. Do, J. Park, and S.-W. Ryu, Strong below-band gap absorption of N-rich side GaNSb by metal-organic chemical vapor deposition, J. Mater. Res. 24, 3569 (2009).
  29. S. Sunkara, V. K. Vendra, J. B. Jasinski, T. Deutsch, A. N. Andriotis, K. Rajan, M. Menon, and M. Sunkara, New visible light absorbing materials for solar fuels, Ga(Sbx)N1x, Advanced Materials 26, 2878 (2014).
  30. D. Komori, K. Takarabe, T. Takeuchi, T. Miyajima, S. Kamiyama, M. Iwaya, and I. Akasaki, GaNSb alloys grown with H2 and N2 carrier gases, Jpn. J. Appl. Phys. 55, 05FD01 (2016).
  31. W. Olszewski, D. Majchrzak, M. Grodzicki, J. Serafińczuk, S. Gorantla, D. Pucicki, P. P. Michałowski, R. Kudrawiec, and D. Hommel, Monocrystalline GaN diluted with up to 7% arsenic grown by MOVPE, Cryst. Growth Des. 24, 4057 (2024).
  32. W. Shan, W. Walukiewicz, J. W. Ager, E. E. Haller, J. F. Geisz, D. J. Friedman, J. M. Olson, and S. R. Kurtz, Band anticrossing in GaInNAs alloys, Phys. Rev. Lett. 82, 1221 (1999).
  33. J. Wu, W. Shan, and W. Walukiewicz, Band anticrossing in highly mismatched III-V semiconductor alloys, Semicond. Sci. Technol. 17, 860 (2002).
  34. I. A. Buyanova, M. Izadifard, A. Kasic, H. Arwin, W. M. Chen, H. P. Xin, Y. G. Hong, and C. W. Tu, Analysis of band anticrossing in GaNxP1x alloys, Phys. Rev. B 70, 085209 (2004).
  35. T. D. Veal, L. F. J. Piper, P. H. Jefferson, I. Mahboob, C. F. McConville, M. Merrick, T. J. C. Hosea, B. N. Murdin, and M. Hopkinson, Photoluminescence spectroscopy of bandgap reduction in dilute InNAs alloys, Appl. Phys. Lett. 87, 182114 (2005).
  36. P. H. Jefferson, T. D. Veal, L. F. J. Piper, B. R. Bennett, C. F. McConville, B. N. Murdin, L. Buckle, G. W. Smith, and T. Ashley, Band anticrossing in GaNxSb1x, Appl. Phys. Lett. 89, 111921 (2006).
  37. R. Kudrawiec, A. V. Luce, M. Gladysiewicz, M. Ting, Y. J. Kuang, C. W. Tu, O. D. Dubon, K. M. Yu, and W. Walukiewicz, Electronic band structure of GaNxPyAs1xy highly mismatched alloys: Suitability for intermediate-band solar cells, Phys. Rev. Appl. 1, 034007 (2014).
  38. J. Wu, W. Walukiewicz, K. M. Yu, J. D. Denlinger, W. Shan, J. W. Ager, A. Kimura, H. F. Tang, and T. F. Kuech, Valence band hybridization in N-rich GaN1xAsx alloys, Phys. Rev. B 70, 115214 (2004).
  39. P. R. C. Kent and A. Zunger, Theory of electronic structure evolution in GaAsN and GaPN alloys, Phys. Rev. B 64, 115208 (2001).
  40. P. R. Kent, L. Bellaiche, and A. Zunger, Pseudopotential theory of dilute III-V nitrides, Semicond. Sci. Technol. 17, 851 (2002).
  41. D. Borovac, C.-K. Tan, and N. Tansu, First-principle study of the optical properties of dilute-P GaN1xPx alloys, Sci. Rep. 8, 6025 (2018).
  42. J. C. Goodrich, D. Borovac, C.-K. Tan, and N. Tansu, Band anti-crossing model in dilute-As GaNAs alloys, Sci. Rep. 9, 5128 (2019).
  43. M. P. Polak, R. Kudrawiec, and O. Rubel, Electronic band structure of nitrogen diluted Ga(PAsN): Formation of the intermediate band, direct and indirect optical transitions, and localization of states, J. Appl. Phys. 126, 175701 (2019).
  44. M. P. Polak, P. Scharoch, and R. Kudrawiec, The effect of isovalent doping on the electronic band structure of group IV semiconductors, J. Phys. D: Appl. Phys. 54, 085102 (2020).
  45. E. Zdanowicz, P. Ciechanowicz, K. Opolczynska, D. Majchrzak, J.-G. Rousset, E. Piskorska-Hommel, M. Grodzicki, K. Komorowska, J. Serafinczuk, D. Hommel, and R. Kudrawiec, As-related stability of the band gap temperature dependence in N-rich GaNAs, Appl. Phys. Lett. 115, 092106 (2019).
  46. I. Vurgaftman and J. R. Meyer, Band parameters for nitrogen-containing semiconductors, J. Appl. Phys. 94, 3675 (2003).
  47. V. Popescu and A. Zunger, Extracting E versus k effective band structure from supercell calculations on alloys and impurities, Phys. Rev. B 85, 085201 (2012).
  48. G. Kresse and J. Hafner, Ab initio molecular dynamics for liquid metals, Phys. Rev. B 47, 558 (1993).
  49. G. Kresse and J. Furthmüller, Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set, Phys. Rev. B 54, 11169 (1996).
  50. G. Kresse and J. Furthmüller, Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set, Comput. Mater. Sci. 6, 15 (1996).
  51. G. Kresse and D. Joubert, From ultrasoft pseudopotentials to the projector augmented-wave method, Phys. Rev. B 59, 1758 (1999).
  52. D. M. Ceperley and B. J. Alder, Ground state of the electron gas by a stochastic method, Phys. Rev. Lett. 45, 566 (1980).
  53. J. P. Perdew and A. Zunger, Self-interaction correction to density-functional approximations for many-electron systems, Phys. Rev. B 23, 5048 (1981).
  54. F. Tran and P. Blaha, Accurate band gaps of semiconductors and insulators with a semilocal exchange-correlation potential, Phys. Rev. Lett. 102, 226401 (2009).
  55. A. van de Walle, P. Tiwary, M. de Jong, D. Olmsted, M. Asta, A. Dick, D. Shin, Y. Wang, L.-Q. Chen, and Z.-K. Liu, Efficient stochastic generation of special quasirandom structures, Calphad 42, 13 (2013).
  56. A. van de Walle, M. Asta, and G. Ceder, The alloy theoretic automated toolkit: A user guide, Calphad 26, 539 (2002).
  57. Q. Zheng, VaspBandUnfolding, https://github.com/QijingZheng/VaspBandUnfolding.

Outline

Information

Sign In to Your Journals Account

Filter

Filter

Article Lookup

Enter a citation