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Laser discharge in a high-pressure jet of heavy noble gas: Expansion of emitting volume promises an efficient source of EUV light for lithography

I.S. Abramov ^*, S.V. Golubev , E.D. Gospodchikov , and A.G. Shalashov

A.A. Perekalov , A.N. Nechay, and N.I. Chkhalo

A. V. Gaponov-Grekhov Institute of Applied Physics of the Russian Academy of Sciences, Nizhny Novgorod, Russia

Institute for Physics of Microstructures of the Russian Academy of Sciences, Nizhny Novgorod, Russia

^*Contact author: abramov@ipfran.ru

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Phys. Rev. Applied 23, 024004 – Published 3 February, 2025

DOI: https://doi.org/10.1103/PhysRevApplied.23.024004

Abstract

A discharge with multiply charged ions of a noble gas supported by a powerful infrared laser in a high-pressure jet is considered as a source of extreme ultraviolet (EUV) light radiation in particular narrow bands demanded by next-generation lithography. In a proof-of-principle experiment in krypton, the EUV-emitting region is visualized using a dedicated EUV microscope. Measurements support a basic model of underlying physics that involves expansion of the emitting plasma outside the laser focus. In simulations, we show that using the xenon jet, more optimal for EUV emission, may provide an efficiency competitive to the best commercial EUV sources for lithography.

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References (42)

H. Tanuma, H. Ohashi, S. Fujioka, H. Nishimura, A. Sasaki, and K. Nishihara, 4d-4f unresolved transition arrays of xenon and tin ions in charge exchange collisions, J. Phys. Conf. Ser. 58, 231 (2007).
N. I. Chkhalo and N. N. Salashchenko, Next generation nanolithography based on $Ru$ / $Be$ and $Rh$ / $Sr$ multilayer optics, AIP Adv. 3, 082130 (2013).
G. D. Kubiak, L. J. Bernardez, and K. D. Krenz, High-power extreme-ultraviolet source based on gas jets, Proc. SPIE 3331, 81 (1998).
R. H. Moyer, H. Shields, A. Martos, S. W. Fornaca, R. J. St. Pierre, and M. B. Petach, Laser-produced plasma (LPP) scale-up and commercialization, Proc. SPIE 4343, 249 (2001).
H. Shields, S. W. Fornaca, M. B. Petach, M. Michaelian, R. D. McGregor, R. H. Moyer, and R. J. St. Pierre, Xenon target performance characteristics for laser-produced plasma EUV sources, Proc. SPIE 4688, 94 (2002).
B. A. M. Hansson, O. Hemberg, H. M. Hertz, M. Berglund, H.-J. Choi, B. Jacobsson, E. Janin, S. Mosesson, L. Rymell, J. Thoresen, and M. Wilner, Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source, Rev. Sci. Instrum. 75, 2122 (2004).
R. M. Smertin, N. I. Chkhalo, M. N. Drozdov, S. A. Garakhin, S. Yu. Zuev, V. N. Polkovnikov, N. N. Salashchenko, and P. A. Yunin, Influence of $Mo$ interlayers on the microstructure of layers and reflective characteristics of $Ru$ / $Be$ multilayer mirrors, Opt. Express 30, 46749 (2022).
A. N. Nechai, A. A. Perekalov, N. N. Salashchenko, and N. I. Chkhalo, Emission spectra of heavy inert gases $Kr$ and $Xe$ in the range from 3 to 20 nm obtained under pulsed laser excitation using various gas jets as targets, Opt. Spectrosc. 129, 363 (2021).
N. I. Chkhalo, S. A. Garakhin, A. Ya. Lopatin, A. N. Nechay, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, N. N. Tsybin, and S. Yu. Zuev, Conversion efficiency of a laser-plasma source based on a $Xe$ jet in the vicinity of a wavelength of 11 nm, AIP Adv. 8, 105003 (2018).
S. G. Kalmykov, P. S. Butorin, and M. E. Sasin, $Xe$ laser-plasma EUV radiation source with a wavelength near 11 nm—optimization and conversion efficiency, J. Appl. Phys. 126, 103301 (2019).
S. G. Kalmykov, P. S. Butorin, M. E. Sasin, and V. S. Zakharov, Absorption of laser radiation in a laser-produced plasma of $Xe$ : Hydrodynamic effects and nonequilibrium ionization, J. Phys. D: Appl. Phys. 55, 105203 (2022).
V. E. Guseva, A. N. Nechay, A. A. Perekalov, N. N. Salashchenko, and N. I. Chkhalo, Investigation of emission spectra of plasma generated by laser pulses on $Xe$ gas-jet targets, Appl. Phys. B 129, 155 (2023).
J. van Schoot, Exposure tool development toward advanced EUV lithography: A journey of 40 years driving Moore’s law, IEEE Trans. Electron Devices 2, 8 (2024).
I. Fomenkov, A. Schafgans, and D. Brandt, Laser-produced plasma sources for high-volume-manufacturing EUV lithography, Synchrotron Radiat. News 32, 3 (2019).
M. Purvis, I. V. Fomenkov, A. A. Schafgans, M. Vargas, S. Rich, Y. Tao, S. I. Rokitski, M. Mulder, E. Buurman, M. Kats et al., Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W, Proc. SPIE 10583, 1058327 (2018).
I. S. Abramov, S. V. Golubev, E. D. Gospodchikov, and A. G. Shalashov, Expansion of laser discharge in xenon jet improves EUV-light emission, Appl. Phys. Lett. 123, 193502 (2023).
N. I. Chkhalo, New concept for the development of high-performance $X$ -ray lithography, Russ. Microelectron. 53, 397 (2024).
J. A. R. Samson and W. C. Stolte, Precision measurements of the total photoionization cross-sections of $He$ , $Ne$ , $Ar$ , $Kr$ , and $Xe$ , J. Electron Spectros. Relat. Phenomena 123, 265 (2002).
J. B. West and G. V. Marr, The absolute photoionization cross sections of helium, neon, argon and krypton in the extreme vacuum ultraviolet region of spectrum, Proc. R. Soc. Lond. A 349, 397 (1976).
S. Yu. Zuev, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, D. A. Tatarskiy, N. N. Tsybin, and N. I. Chkhalo, Comparative study of the thermal stability of $Be$ -based extreme ultraviolet pellicles, Tech. Phys. 68, S630 (2023).
M. V. Svechnikov, N. I. Chkhalo, S. A. Gusev, A. N. Nechay, D. E. Pariev, A. E. Pestov, V. N. Polkovnikov, D. A. Tatarskiy, N. N. Salashchenko, F. Schäfers et al., Influence of barrier interlayers on the performance of $Mo$ / $Be$ multilayer mirrors for next-generation EUV lithography, Opt. Express 26, 33718 (2018).
T. Harada, N. Teranishi, T. Watanabe, Q. Zhou, J. Bogaerts, and X. Wang, High-exposure-durability, high-quantum-efficiency ( $> 90 %$ ) backside-illuminated soft- $X$ -ray CMOS sensor, Appl. Phys. Express 13, 016502 (2020).
Yu. P. Raizer, Gas Discharge Physics (Springer-Verlag Berlin, Heidelberg, 1991).
V. M. Povyshev, A. A. Sadovoy, V. P. Shevelko, G. D. Shirkov, E. G. Vasina, and V. V. Vatulin, Electron-impact ionization cross sections of $H$ , $He$ , $N$ , $O$ , $Ar$ , $Xe$ , $Au$ , $Pb$ atoms and their ions in the electron energy range from threshold up to 200 keV, JINR Commun. No. E9-2001-148 (2001).
A. V. Philippov, V. M. Povyshev, A. A. Sadovoy, V. P. Shevelko, G. D. Shirkov, E. G. Vasina, and V. V. Vatulin, Electron-impact ionization cross sections of $Ti$ , $Kr$ , $Sn$ , $Ta$ , $U$ atoms and their ions in the electron energy range from the threshold up to 200 keV, JINR Commun. No. E9-2002-5 (2002).
Ya. B. Zeldovich and Yu. P. Raizer, Physics of Shock Waves and High-Temperature Hydrodynamic Phenomena (Academic Press, NY, 1966).
S. S. Churilov, Y. N. Joshi, J. Reader, and R. R. Kildiyarova, $4 p^{6} 4 d^{8} - (4 d^{7} 5 p + 4 d^{7} 4 f + 4 p^{5} 4 d^{9})$ transitions in $Xe$ XI, Phys. Scr. 70, 126 (2004).
S. S. Churilov and Y. N. Joshi, Analysis of the $4 p^{6} 4 d^{8} 4 f$ and $4 p^{5} 4 d^{10}$ configurations of $Xe$ X and some highly excited levels of $Xe$ VIII and $Xe$ IX ions, Phys. Scr. 65, 40 (2002).
R. D. Cowan, The Theory of Atomic Structure and Spectra (University of California Press, Berkeley, 1981).
H. Van Regemorter, Rate of collisional excitation in stellar atmospheres, Astrophys. J. 136, 906 (1962).
D. H. Sampson and H. L. Zhang, Use of the Van Regemorter formula for collision strengths or cross-sections, Phys. Rev. A 45, 1556 (1992).
I. S. Abramov, E. D. Gospodchikov, and A. G. Shalashov, Extreme-ultraviolet light source for lithography based on an expanding jet of dense xenon plasma supported by microwaves, Phys. Rev. Appl. 10, 034065 (2018).
J. P. Apruzese, An analytic Voigt profile escape probability approximation, JQSRT 34, 447 (1985).
S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada et al., Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas, Phys. Rev. Lett. 95, 235004 (2005).
E. R. Kieft, K. Garloff, J. J. A. M. van der Mullen, and V. Banine, Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges, Phys. Rev. E 71, 036402 (2005).
L. Spitzer and R. Harm, Transport phenomena in a completely ionized gas, Phys. Rev. 89, 977 (1953).
S. I. Braginskii, Transport phenomena in a completely ionized two-temperature plasma, Sov. Phys. JETP 6, 358 (1958).
S. I. Braginskii, Transport processes in a plasma, Rev. Plasma Phys. 1, 205 (1965).
M. A. Korepanov, M. R. Koroleva, and E. A. Mitrukova, Numerical investigation of flows with condensation in micronozzles, J. Phys.: Conf. Ser. 2057, 012016 (2021).
V. Bakshi, EUV Sources for Lithography (SPIE Press, Bellingham, Washington, 2006).
I. Kuznetsov, I. Mukhin, O. Palashov, and K. Ueda, Thin-tapered-rod $Yb$ :YAG laser amplifier, Opt. Lett. 41, 5361 (2016).
I. Kuznetsov, S. Chizhov, and O. Palashov, $Yb$ :YAG diverging beam amplifier with 20 mJ pulse energy and 1.5 kHz repetition rate, Opt. Lett. 48, 1292 (2023).

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Laser discharge in a high-pressure jet of heavy noble gas: Expansion of emitting volume promises an efficient source of EUV light for lithography

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