- Access by Xinjiang University
Extraordinary magnetoresistance in high-quality graphene devices with daisy chains and Fermi-level pinning
Phys. Rev. Applied 22, 064046 – Published 12 December, 2024
DOI: https://doi.org/10.1103/PhysRevApplied.22.064046
Abstract
We have studied daisy-chained extraordinary magnetoresistance (EMR) devices based on high-quality monolayer graphene encapsulated in hexagonal boron nitride at room temperature. The largest magnetoresistance achieved in our devices is 4.6 × 107%, the record for EMR devices to date. The magnetic field sensitivity dR/dB reaches 104 kΩ/T, exceeding the previous record set by encapsulated graphene by more than 300%, and is comparable with state-of-the-art graphene Hall sensors at cryogenic temperatures (4.2 K). We demonstrate that daisy-chaining multiple EMR devices is an alternative way to reach arbitrarily high sensitivity and signal-to-noise ratio, and extremely small noise equivalent field for weak magnetic field detection. Finally, we show the evidence of metal contact–induced Fermi-level pinning in the sample and its influence on graphene properties, current distribution, and EMR performance. We highlight the EMR geometry as an interesting alternative to the Hall geometry for fundamental physics studies.
Physics Subject Headings (PhySH)
Article Text
References (44)
- W. F. Egelhoff, Jr., T. Ha, R. D. K. Misra, Y. Kadmon, J. Nir, C. J. Powell, M. D. Stiles, R. D. McMichael, C-L Lin, J. M. Sivertsen, et al., Magnetoresistance values exceeding 21% in symmetric spin valves, J. Appl. Phys. 78, 273 (1995).
- S. Jin, M. McCormack, T. H. Tiefel, and R. Ramesh, Colossal magnetoresistance in --- ferromagnetic thin films (invited), J. Appl. Phys. 76, 6929 (1994).
- S. A. Solin, T. Thio, D. R. Hines, and J. J. Heremans, Enhanced room-temperature geometric magnetoresistance in inhomogeneous narrow-gap semiconductors, Science 289, 1530 (2000).
- S. A. Solin and T. Zhou, in 2001 International Conference on Solid State Devices and Materials (Tokyo, Japan, 2001), pp. 570–571.
- T. H. Hewett and F. V. Kusmartsev, Extraordinary magnetoresistance: Sensing the future, Cent. Eur. J. Phys. 10, 602 (2012).
- B. Zhou, K. Watanabe, T. Taniguchi, and E. A. Henriksen, Extraordinary magnetoresistance in encapsulated monolayer graphene devices, Appl. Phys. Lett. 116, 053102 (2020).
- J. Lu, H. Zhang, W. Shi, Z. Wang, Y. Zheng, T. Zhang, N. Wang, Z. Tang, and P. Sheng, Graphene magnetoresistance device in van der Pauw geometry, Nano Lett. 11, 2973 (2011).
- T. H. Hewett and F. V. Kusmartsev, Geometrically enhanced extraordinary magnetoresistance in semiconductor-metal hybrids, Phys. Rev. B 82, 212404 (2010).
- A. S. Mayorov, R. V. Gorbachev, S. V. Morozov, L. Britnell, R. Jalil, L. A. Ponomarenko, P. Blake, K. S. Novoselov, K. Watanabe, T. Taniguchi, et al., Micrometer-scale ballistic transport in encapsulated graphene at room temperature, Nano Lett. 11, 2396 (2011).
- L. Banszerus, M. Schmitz, S. Engels, M. Goldsche, K. Watanabe, T. Taniguchi, B. Beschoten, and C. Stampfer, Ballistic transport exceeding 28 m in CVD grown graphene, Nano Lett. 16, 1387 (2016).
- S. H. Bickel, Small signal compensation of magnetic fields resulting from aircraft maneuvers, IEEE Trans. Aerosp. Electron. Syst. AES-15, 518 (1979).
- L. Tian, Z. Wang, W. Liu, Y. Cheng, F. E. Alsaadi, and X. Liu, An improved generative adversarial network with modified loss function for crack detection in electromagnetic nondestructive testing, Complex Intell. Syst. 8, 467 (2022).
- J. Isakovic, I. Dobbs-dixon, D. Chaudhury, and D. Mitrecic, Modeling of inhomogeneous electromagnetic fields in the nervous system: A novel paradigm in understanding cell interactions, disease etiology and therapy, Sci. Rep. 8, 12909 (2018).
- D. Drung, C. Aßmann, J. Beyer, A. Kirste, M. Peters, F. Ruede, and T. Schurig. in IEEE Transactions on Applied Superconductivity (2007), Vol. 17, pp. 699–704.
- M. J. Brookes, J. Leggett, M. Rea, R. M. Hill, N. Holmes, E. Boto, and R. Bowtell, Magnetoencephalography with optically pumped magnetometers (OPM-MEG): The next generation of functional neuroimaging, Trends Neurosci. 45, 621 (2022).
- B. T. Schaefer, L. Wang, A. Jarjour, K. Watanabe, T. Taniguchi, P. L. McEuen, and K. C. Nowack, Magnetic field detection limits for ultraclean graphene Hall sensors, Nat. Commun. 11, 4163 (2020).
- L. Wang, P. Makk, S. Zihlmann, A. Baumgartner, D. I. Indolese, K. Watanabe, T. Taniguchi, and C. Schönenberger, Mobility enhancement in graphene by in situ reduction of random strain fluctuations, Phys. Rev. Lett. 124, 157701 (2020).
- Bowen Zhou, Arts & Sciences Electronic Theses and Dissertations, Open Scholarship, (2019), p. 1801. https://openscholarship.wustl.edu/art_sci_etds/1801.
- G. Song, M. Ranjbar, and R. A. Kiehl, Operation of graphene magnetic field sensors near the charge neutrality point, Commun. Phys. 2, 65 (2019).
- D. Collomb, P. Li, and S. Bending, Frontiers of graphene-based Hall-effect sensors, J. Phys.: Condens. Matter. 33, 243002 (2021).
- L. Wang, I. Meric, P. Y. Huang, Q. Gao, Y. Gao, H. Tran, T. Taniguchi, K. Watanabe, L. M. Campos, D. A. Muller, et al., One-dimensional electrical contact to a two-dimensional material, Science 342, 614 (2013).
- J. Sun, C. P. Gooneratne, and J. Kosel, Design study of a bar-type EMR device, IEEE Sens. J. 12, 1356 (2012).
- J. Dauber, A. A. Sagade, M. Oellers, K. Watanabe, T. Taniguchi, D. Neumaier, and C. Stampfer, Ultra-sensitive Hall sensors based on graphene encapsulated in hexagonal boron nitride, Appl. Phys. Lett. 106, 193501 (2015).
- W. Poirier and F. Schopfer, Resistance metrology based on the quantum Hall effect, Eur. Phys. J.: Spec. Top. 172, 207 (2009).
- W. Poirier, A. Bounouh, F. Piquemal, and J. P. André, A new generation of QHARS: Discussion about the technical criteria for quantization, Metrologia 41, 285 (2004).
- M. Ortolano and L. Callegaro, Matrix method analysis of quantum Hall effect device connections, Metrologia 49, 1 (2012).
- F. Delahaye, Series and parallel connection of multiterminal quantum Hall-effect devices, J. Appl. Phys. 73, 7914 (1993).
- M. Woszczyna, M. Friedemann, T. Dziomba, T. Weimann, and F. J. Ahlers, Graphene p-n junction arrays as quantum-Hall resistance standards, Appl. Phys. Lett. 99, 022112 (2011).
- S. El-Ahmar, W. Koczorowski, A. A. Poźniak, P. Kuświk, W. Strupiński, and R. Czajka, Graphene-based magnetoresistance device utilizing strip pattern geometry, Appl. Phys. Lett. 110, 043503 (2017).
- Y. Shao, S. A. Solin, L. R. Ram-Mohan, and K. H. Yoo, Optimizing the physical contribution to the sensitivity and signal to noise ratio of extraordinary magnetoresistance quantum well structures, J. Appl. Phys. 101, 123704 (2007).
- S. A. Solin, D. R. Hines, A. C. H. Rowe, J. S. Tsai, and Y. A. Pashkin, Nanoscopic magnetic field sensor based on extraordinary magnetoresistance, J. Vac. Sci. Technol., B 21, 3002 (2003).
- S. A. Solin, Design and Properties of a scanning EMR probe Microscope, ArXiv:Cond-Mat/0602146 (2006).
- X. Liu, M. S. Choi, E. Hwang, W. J. Yoo, and J. Sun, Fermi level pinning dependent 2D semiconductor devices: Challenges and prospects, Adv. Mater. 34, 2108425 (2022).
- P. A. Khomyakov, G. Giovannetti, P. C. Rusu, G. Brocks, J. Van Den Brink, and P. J. Kelly, First-principles study of the interaction and charge transfer between graphene and metals, Phys. Rev. B 79, 195425 (2009).
- F. Xia, V. Perebeinos, Y. M. Lin, Y. Wu, and P. Avouris, The origins and limits of metal-graphene junction resistance, Nat. Nanotechnol. 6, 179 (2011).
- A. Di Bartolomeo, S. Santandrea, F. Giubileo, F. Romeo, M. Petrosino, R. Citro, P. Barbara, G. Lupina, T. Schroeder, and A. Rubino, Effect of back-gate on contact resistance and on channel conductance in graphene-based field-effect transistors, Diamond Relat. Mater. 38, 19 (2013).
- S. M. Song, J. K. Park, O. J. Sul, and B. J. Cho, Determination of work function of graphene under a metal electrode and its role in contact resistance, Nano Lett. 12, 3887 (2012).
- A. L. Friedman, J. T. Robinson, F. K. Perkins, and P. M. Campbell, Extraordinary magnetoresistance in shunted chemical vapor deposition grown graphene devices, Appl. Phys. Lett. 99, 022108 (2011).
- Y. Matsuda, W. Q. Deng, and W. A. Goddard, Contact resistance for “end-contacted” metal-graphene and metal-nanotube interfaces from quantum mechanics, J. Phys. Chem. C 114, 17845 (2010).
- Q. Gao and J. Guo, Role of chemical termination in edge contact to graphene, APL Mater. 2, 056105 (2014).
- E. Klokholm, Intrinsic stress in evaporated metal films, J. Vac. Sci. Technol. 6, 138 (1969).
- X. Miao, S. Tongay, and A. F. Hebard, Strain-induced suppression of weak localization in CVD-grown graphene, J. Phys.: Condens. Matter 24, 475304 (2012).
- N. J. G. Couto, D. Costanzo, S. Engels, D. K. Ki, K. Watanabe, T. Taniguchi, C. Stampfer, F. Guinea, and A. F. Morpurgo, Random strain fluctuations as dominant disorder source for high-quality on-substrate graphene devices, Phys. Rev. X 4, 041019 (2014).
- P. Bøggild, J. M. Caridad, C. Stampfer, G. Calogero, N. R. Papior, and M. Brandbyge, A two-dimensional Dirac fermion microscope, Nat. Commun. 8, 15783 (2017).