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Effect of Etching on the Relative Intensities of the Components of Double Laue Spots Obtained from a Quartz Crystal
Phys. Rev. 43, 562 – Published 1 April, 1933
DOI: https://doi.org/10.1103/PhysRev.43.562
Abstract
Laue patterns obtained from a quartz crystal of dimensions 100×6×2 millimeters taken through the 2 millimeter direction are given. One face of the crystal was highly polished and the other face was etched. The pattern obtained when the etched face of the crystal was next to the photographic film exhibited a weaker inner component for spots close to the origin; the pattern obtained when the etched face of the crystal was next to the source of x-rays exhibited a stronger inner component for spots close to the origin. The pattern obtained when the etched face of the crystal was next to the photographic film and the crystal was oscillating piezoelectrically along the direction of the long dimension showed no appreciable difference from the pattern obtained with the crystal in this same position when at rest. An explanation of the recent results obtained by J. M. Cork is offered.
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