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  • Access by Xinjiang University

Some Comment on the Photo-Magneto-Electric Effect in Silicon

R. E. Barker, Jr.

  • General Electric Research and Development Center, Schenectady, New York

Phys. Rev. 149, 663 – Published 16 September, 1966Erratum Phys. Rev. 156, 1038 (1967)

DOI: https://doi.org/10.1103/PhysRev.149.663

Abstract

Some measurements by Mette and Boatright of the photo-magneto-electric (PME) open-circuit voltage V at 25°C in Si have been reanalyzed on the basis of a simple photodissociation model. Good agreement between the predictions of the model and the data is obtained. The main results are expressed by the proportionality VB(ΔW×I)12, where B is the magnetic induction, ΔW is the excess photon energy above a threshold (found to be 1.08 eV), and I is the photon flux density. V is also predicted to be proportional to exp(ΔGrkT), where ΔGr is the Gibbs function associated with a postulated barrier to recombination of electrons and holes. Data were not available to check this latter prediction and future experiments are suggested. An implication of the model is that the PME effect is due to photons which are absorbed within a distance less than the recombination length from the electrodes.

Erratum

Some Comments on the Photomagnetoelectric Effect in Silicon

R. E. Barker, Jr.
Phys. Rev. 156, 1038 (1967)

References (4)

  1. H. L. Mette and A. Boatright, Phys. Rev. 140, A919 (1965)
  2. R. E. Barker, Jr. and C. R. Thomas, J. Appl. Phys. 35, 3202 (1964)
  3. J. H. Schulman and W. D. Compton, Color Centers in Solids (The Macmillan Company, New York, 1962), p. 313
  4. N. C. MacDonald and T. E. Everhart, Appl. Phys. Letters 7, 267 (1966)

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