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Electron Spin-Lattice Relaxation at Defect Sites; Centers in Synthetic Quartz at 3 Kilo-Oersteds
Phys. Rev. 130, 577 – Published 15 April, 1963
DOI: https://doi.org/10.1103/PhysRev.130.577
Abstract
Measurements of the spin-lattice relaxation time by the inversion-recovery technique are reported for two paramagnetic centers in quartz over a wide temperature range: from 1.3 to 250°K for the center, and from 2 to 80°K the center. The data, extending over several orders of magnitude in , are interpreted in terms of cross relaxation, direct processes, and Raman processes. The dominant feature of the Raman relaxation is a temperature variation of about , which is much slower than expected by standard theory.
The theory of spin-lattice relaxation is extended to account for the modification at a defect site of the strain due to a lattice wave. Each defect has at least one characteristic frequency and the local strain due to a wave of higher frequency is enhanced, being essentially given by the displacement due to the wave, rather than its spatial derivative. If the characteristic frequency is sufficiently low compared to the Debye frequency, the Raman relaxation rate should vary as (or ) over a wide range of temperatures, instead of the usual (or ) variation.
A detailed comparison of the relaxation rates observed for the two centers with the above theory suggests that each center has two characteristic frequencies or temperatures . For the center one of these (K) is ascribed to the vibration of a neighboring impurity ion, probably a proton. The other temperature (≃5°K) may arise from the motion of oxygen ions at the defect. The center has the two characteristic temperatures of 140°K and 14°K.
A model for the center is proposed: An electron is trapped at a silicon ion located in an oxygen divacancy. This model leads to the likelihood of low characteristic frequencies through a non-rigid Si group, and also through a net negative charge, which should attract one or more interstitial impurity ions.
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